题  目：纳米印刷和电子束印刷的纳米制备及其应用

    报告人：崔  波 博士

    时  间：2015 年12月21日（周一）下午19:00

    地  点：高等研究院13楼报告厅（建工楼B1301）

【报告摘要】 E-beam lithography (EBL) and nanoimprint lithography (NIL) are two most popular nanolithography techniques. EBL is based on material (called resist) property modification by its exposure to focused electron beam; whereas NIL relies on the mechanical conformation of a low viscosity resist to the structures of a mold. NIL offers high resolution (2nm), high throughput (up to one wafer/minute), low cost and high pattern transfer fidelity, though the mold has to be fabricated by the slow and expensive EBL. In the talk, I will first present our work on NIL using fluoro-polymer and hard/soft bi-layer mold that have advantages over conventional silicon mold. Then I will present EBL resist with a focus of polystyrene that can achieve ultra-high sensitivity or ultra-high resolution; and more importantly, it can be evaporated in order to pattern any non-flat surface such as an AFM cantilever or an optical fiber. Next, I will cover a few applications of nanostructures fabricated by NIL and EBL, including metallic nanostructures for chemical/bio-sensor based on surface enhanced Raman spectroscopy (SERS), and for the detection of DNA hybridization by surface plasmon resonance (SPR), as well as application of grating structure of polystyrene (biocompatible) for guided cell growth with a goal for tissue repair.

【报告人简介】崔波，博士，现为加拿大滑铁卢大学电子与计算机工程系及滑铁卢纳米研究院教授。1994年毕业于北京大学物理系获学士学位，2000年及2003年于美国普林斯顿大学电子工程系分别获硕士与博士学位，师从美国工程院院士Stephen Y Chou教授做纳米加工方面的研究。2003年至2008年在加拿大国家实验室（NRC）做研究。2008年11月加入滑铁卢大学至今。

至今已发表期刊文章90篇，引用1498次，会议报告100余次。申请专利3项（两项获批），编辑纳米加工方面的专著一本。2014年获得优秀科研奖（Engineering Research Excellence Award）。现为Nanoscale Research Letters的副主编。

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